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DAS Announces Point-Of-Use Gas Abatement In Wet Bench Semiconductor Processes

DAS Environmental Expert DmbH has developed and installed what it calls the SALIX system, the world’s first point-of-use system for removing waste gas pollutants in semiconductor wafer manufacturing wet bench applications.

DAS Environmental Expert GmbH (Dresden, Germany) has developed and installed what it calls the SALIX system, the world’s first point-of-use system for removing waste gas pollutants in semiconductor wafer manufacturing wet bench applications. The SALIX system could, in addition to the semiconductor industry, could also be used in TFT-LED/OLED display, electronics and photovoltaic processes. The company says that after six months of evaluation, the system has been fully effective in removing waste gas pollutants this process, thanks to a unique approach of using a high-efficiency, small footprint point-of-use system. One SALIX system per wet bench is the only required exhaust treatment system, and that leads to just a single pipe for the cleaned exhaust, which contains zero harmful substances.

The two-stage scrubber process removes pollutants from the gas stream by chemical and physical absorption. These waste gases are passed through a two-stage scrubber with different washing liquids. SALIX can treat up to 3,600 m3/h of raw gas, and after the process is complete, the remaining clean gas can be released safely into the air without any danger to the technology or the environment. Because the system does not require any air dilution, the clean air remains in the clean room, further reducing cost.

The company has also announced that Technica will join its network of service partners. They will be able to supply U.S.-based DAS customers with maintenance professionals to keep their abatement systems running.

To learn more, visit www.das-europe.com.

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