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Pfeiffer Vacuum’s sputter process monitor SPM 220 and high-pressure analyzer HPA 220 gas analysis systems are used to monitor and document vacuum processes. According to the company, the systems are characterized by:
SPM 220
- Available in mass ranges of 1 to 100 and 1 to 200 amu.
- A specially developed ion source, which enables a direct connection between the analyzer and the process chamber (enables the vacuum conditions of sputter processes and similar applications to be monitored without the time delays of an inlet system, at a pressure up to 10-2 mbar).
- An additional orifice system allows the pressure range to be expanded up to 10 mbar.
- Equipped with a number of digital and analog inlets and outlets.
HPA 220
- Available in mass ranges of 1 to 100 and 1 to 200 amu and is also available from 1 to 300 amu.
- Available, depending on the application conditions, with three different gas inlet valves, both manually and electropneumatically operated.
- Its compact, modular design provides a versatile solution for gas analysis in the pressure range from high vacuum to 50 mbar.
- Equipped with a number of digital and analog inlets and outlets.