W. L. Gore & Associates has announced the release of GORE® filters for semiconductor applications. The family of 20nm- to 100nm-rated cartridge filters for chemicals, dilute chemicals, and ultrapure water in wet process tools incorporates a new high-flow ePTFE filtration media that allows a drop-in retention upgrade from 100nm to 30nm, enabling cleaner recirculation baths, reduced processing times and significant savings in cost of ownership. The cartridge filters also:
- Enable up to three times the flow compared to the next best-in-class filters.
- Provide a drop-in replacement that improves retention performance, reduces particle counts, lowers operating differential pressures, reduces processing times, and enables faster bath turnovers.
- Allow flow rates to be maintained or even increased with as few as 1/3 the number of filters used previously.
